Description
Specially Designed UHV Chamber with Wide Range in situ Preparation Techniques including Ion Etching, E-beam Deposition, LEED and RHEED analysis.
- Ion source IQE 11/35 for sample cleaning
- Plasma sources PCS-ECR, MPS-ECR or PCS-RF for sample preparation with reactive gases
- E-beam evaporators in single pocket, EBE-1, or multipocket, EBE-4, configurations for thin film depositon
- LEED optics ErLEED with Auger option and Safire software package for image acquisition and evaluation
- RHEED RHD-30 package with Safire software option and elevated pressure option
- Sample manipulator with up to 6 axis, sample size up to 2” and heating and cooling possibilities
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